Inverse response behaviour in the bright ring radius measurement of the Czochralski process II: Mitigation by control

This is the second part of a two-article series investigating presence an inverse response in measurement ingot radius Czochralski process for monocrystalline silicon production, when deduced from camera image bright ring at meniscus connecting solid crystal to melt. Such responses are known pose fundamental limitation achievable control performance. However, measurement, artefact technique and does not appear physical variable one wants (the actual radius). The present article addresses mitigation behaviour, using combination parallel compensation feedback control. proposed design validated against simulations where production subjected temperature disturbances.